November 2021 1 3 Report
Только основания расположены в ряду:

1. HI; FeSO4; NaOH

2. Cu(OH)2; Al(OH)3; Ca(OH)2

3. CO2; KNO3; H2SiO3

4. KCl; Cu(NO3)2; Nа2СO3 ​
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